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Physics of Thin Film Preparation - NBCM213

Title:	Fyzika přípravy tenkých vrstev
Guaranteed by:	Department of Macromolecular Physics (32-KMF)
Faculty:	Faculty of Mathematics and Physics
Actual:	from 2023
Semester:	winter
E-Credits:	3
Hours per week, examination:	winter s.:2/0, Ex [HT]
Capacity:	unlimited
Min. number of students:	unlimited
4EU+:	no
Virtual mobility / capacity:	no
State of the course:	taught
Language:	Czech, English
Teaching methods:	full-time
Teaching methods:	full-time

Guarantor:	prof. Ing. Andrey Shukurov, Ph.D.

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Annotation -

Last update: T_KMF (23.05.2006)

Physical principals of methods of the thin film preparation in vacuum: vacuum evaporation, dc and rf sputtering, plasma deposition of inorganic and organic films, Survey non-vacuum deposition methods.

Course completion requirements -

Last update: prof. Ing. Andrey Shukurov, Ph.D. (28.08.2023)

The lecture course is conducted in presence. The condition for completing the course is proper attendance and passing the oral exam.

Literature -

Last update: prof. Ing. Andrey Shukurov, Ph.D. (29.04.2019)

H. Biederman, Plasma Polymer Films, Imperial College Press 2004, p. 386.

H. Biederman, Y. Osada, Plasma Polymerization Processes, Elsevier Science 1992, p. 210.

J. L. Vossen, W. Kern, Thin Film Processes II, Academic Press 2012, p. 888

Y. Huttel, Gas-Phase Synthesis of Nanoparticles, Wiley-VCH 2017, p. 395.

Requirements to the exam -

Last update: prof. Ing. Andrey Shukurov, Ph.D. (28.08.2023)

The exam is oral and will take place in person. If COVID restrictions are introduced, the exam will be conducted online via Zoom. The requirements for the exam correspond to the syllabus of the course to the extent that was presented in the lecture.

Syllabus -

Last update: prof. Ing. Andrey Shukurov, Ph.D. (28.08.2023)

1. Fundamentals: vacuum, low-temperature plasma, thin films, nanoparticles.

2. Thin film deposition by vacuum evaporation: free evaporation vs. Knudsen cell; electron beam evaporation, pulsed laser deposition.

3. Physical and technical basics of dc and rf sputtering; glancing angle deposition (GLAD); planar and cylindrical magnetrons; reactive magnetron sputtering; High Power Impulse Magnetron Sputtering (HiPIMS).

4. Plasma-enhanced chemical vapor deposition (PECVD), plasma polymerization.

5. Synthesis of nanoclusters and nanoparticles by gas-phase aggregation; gas aggregation cluster sources.

6. Thin film morphology and surface statistics: roughness, correlation length, critical exponents.

7. Models of thin film growth: nucleation, growth and coalescence of islands, structural zone models, discrete models vs. continuum equations.

8. Overview of non-vacuum deposition methods of thin films.

9. Overview of methods of characterization of thin films.