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Last update: T_KMF (23.05.2006)
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Last update: prof. Ing. Andrey Shukurov, Ph.D. (03.02.2021)
The lecture aims to give students a review of up-to-date methods in the area of surface modification. Modern technology in the nano industry, microelectronics, food engineering, biotechnology etc., will be at the center of attention. |
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Last update: prof. Ing. Andrey Shukurov, Ph.D. (14.02.2024)
Oral exam
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Last update: prof. Ing. Andrey Shukurov, Ph.D. (03.02.2021)
[1] Thin Film Processes, J. L. Vossen, W. Kern, eds., Academic Press, 1978, p. 564. [2] Plasma Polymer Films, H. Biederman ed., Imperial College Press, 2004, p. 392. |
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Last update: prof. Ing. Andrey Shukurov, Ph.D. (14.02.2024)
The lectures and the exam are held in person. |
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Last update: prof. Ing. Andrey Shukurov, Ph.D. (14.02.2024)
The exam is oral. The condition for successful completion is systematic attendance. The requirements for the exam correspond to the syllabus of the subject to the extent presented at the lecture. |
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Last update: prof. Ing. Andrey Shukurov, Ph.D. (03.02.2021)
1) Basic terms: surface, interface, thin film 2) Surface wettability, surface energy, contact angle, the hysteresis of contact angles 3) Wettability regimes: Wenzel, Cassie-Baxter (lotus vs. rose petal effects and gecko state), superhydrophobic surfaces from hydrophilic materials, wettability of surfaces with open and closed pores, anti-icing protection of surfaces 4) Overview of methods of surface modification by chemically wet processes: chemical etching, application of Langmuir-Blodgett films and self-assembled monolayers (SAM), electrolytic processes of thin film deposition 5) Vacuum methods of surface modification: chemical etching, chemical vapor deposition (CVD) and epitaxy, hot filament-initiated chemical deposition (iCVD), atomic layer deposition (ALD) 6) Plasma surface modification aimed at changing the structure and chemical composition of the surface: plasma etching and reactive ion etching, modification of inorganic and polymeric surfaces by low-pressure plasma and atmospheric pressure plasma, plasma immersion ion implantation (PIII) 7) Plasma-enhanced chemical vapor deposition (PECVD) of thin films, plasma polymerization for the deposition of hydrocarbon (diamond-like), fluorocarbon, organosilicon, nitrogen-, and oxygen-containing plasma polymers in the form of thin films and nanoparticles 8) Surface modification for biomedical applications
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